This inventor holds 3 USPTO granted patents. Top assignee: Agc Inc.. Active years: 2018-2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Chiyoda-ku, JP (2018)
- Tokyo, JP (2021)
Company Filing History:
Years Active: 2018-2021
Title: Nobuhiko Ikenoya: Innovator in Mask Blank Technology
Introduction
Nobuhiko Ikenoya is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of mask blank technology, holding a total of 3 patents. His work focuses on enhancing the precision and quality of substrates used in photomasks, which are essential in semiconductor manufacturing.
Latest Patents
Ikenoya's latest patents include innovative designs for substrates used as mask blanks. One of his notable inventions is a substrate that features a first main surface with a normal region, a frame-shaped region, and an inner region. This design ensures that the inner region maintains a flatness of 100 nm or less, which is critical for high-precision applications. Another significant patent involves a glass substrate for mask blanks, which includes a rectangular main surface designed for circuit pattern formation. The specifications of this substrate highlight a flatness of less than or equal to 20 nm, ensuring optimal performance in photomask applications.
Career Highlights
Nobuhiko Ikenoya is currently employed at AGC Inc., a leading company in glass and materials technology. His role at AGC Inc. allows him to leverage his expertise in developing advanced materials for the semiconductor industry. His contributions have been instrumental in pushing the boundaries of what is possible in mask blank technology.
Collaborations
Ikenoya has collaborated with notable colleagues such as Yusuke Hirabayashi and Yuzo Okamura. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in their field.
Conclusion
Nobuhiko Ikenoya's work in mask blank technology exemplifies the importance of innovation in the semiconductor industry. His patents reflect a commitment to advancing the quality and precision of materials used in photomasks. Through his career at AGC Inc. and collaborations with talented coworkers, Ikenoya continues to make significant strides in his field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile