Company Filing History:
Years Active: 2020-2022
Title: Nobuaki Seki: Innovator in Ruthenium Etching Technology
Introduction
Nobuaki Seki is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of etching technology, particularly in the processing of ruthenium films. With a total of 2 patents to his name, Seki's work is recognized for its innovative approaches and practical applications.
Latest Patents
One of Seki's latest patents involves an etching method for ruthenium films. This method includes a first step of etching the film using plasma processing with an oxygen-containing gas. The second step involves etching the film with a chlorine-containing gas. These steps are alternately performed to achieve optimal results. The etching process is conducted at a target control temperature for a specific processing time, which is determined based on a pre-obtained relationship between the etching amount per cycle and the control parameters.
Career Highlights
Nobuaki Seki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work focuses on advancing etching technologies that are crucial for the production of high-performance electronic devices. Seki's expertise in plasma processing has positioned him as a key figure in the development of innovative manufacturing techniques.
Collaborations
Seki has collaborated with notable colleagues such as Shigeru Tahara and Takahiko Kato. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Nobuaki Seki's contributions to the field of etching technology, particularly in ruthenium film processing, highlight his innovative spirit and dedication to advancing manufacturing techniques. His work continues to influence the semiconductor industry and showcases the importance of collaboration in driving technological progress.