Shizuoka, Japan

Nobuaki Matsuda


Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Kanagawa, JP (1989)
  • Shizuoka, JP (1994 - 1998)

Company Filing History:


Years Active: 1989-1998

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3 patents (USPTO):Explore Patents

Title: Nobuaki Matsuda: Innovator in Photoresist Technology

Introduction

Nobuaki Matsuda is a prominent inventor based in Shizuoka, Japan. He has made significant contributions to the field of photoresist technology, particularly in the development of solutions for negative-type photosensitive resin compositions. His innovative work has led to the filing of three patents, showcasing his expertise and dedication to advancing this technology.

Latest Patents

Matsuda's latest patents include a developing solution for negative-type photo-sensitive resin compositions. This solution comprises an aqueous mixture containing 0.01 to 1.5% by weight of at least one compound selected from quaternary ammonium bases. The formulation allows for the development of sharp image patterns within a short period without forming mottles. Another notable patent involves a positive image-forming process utilizing a glass substrate with an oxide film, which enhances the efficiency and quality of photoresist applications.

Career Highlights

Matsuda is associated with Fuji Photo Film Company, Limited, where he has been instrumental in advancing photoresist technologies. His work has not only contributed to the company's success but has also positioned him as a key figure in the industry. His innovative solutions have paved the way for improved processes in the field of imaging and photolithography.

Collaborations

Matsuda has collaborated with notable colleagues, including Kesanao Kobayashi and Tadayoshi Kokubo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas, further enhancing the development of cutting-edge technologies in their field.

Conclusion

Nobuaki Matsuda's contributions to photoresist technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in developing effective photo-sensitive materials. Through his work at Fuji Photo Film Company, Limited, he continues to influence the industry and inspire future advancements in imaging technology.

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