The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 1989
Filed:
Jul. 28, 1986
Applicant:
Inventors:
Nobuaki Matsuda, Kanagawa, JP;
Tadayoshi Kokubo, Kanagawa, JP;
Toshiaki Aoai, Kanagawa, JP;
Akira Umehara, Kanagawa, JP;
Yoshimasa Aotani, Kanagawa, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B03C / ;
U.S. Cl.
CPC ...
430270 ; 430191 ; 430192 ; 430296 ; 430326 ; 522 99 ; 522148 ; 525500 ; 525501 ; 525504 ; 525134 ;
Abstract
A positively working resist material is disclosed, comprising a compound having at least one silyl ether group and capable of directly dissociating an Si-O-C bond upon irradiation with far ultraviolet rays, X-rays, an electron beam, or an ion beam. The resist material has high sensitivity to high energy radiation, excellent resistance to dry etching, and can be developed with an alkaline aqueous solution.