Tadayoshi Kokubo

This inventor holds 33 USPTO granted patents, primarily in Photoresist Composition. Top assignees: Fuji Photo Film Company, Limited, Nippon Telegraph and Telephone Corporation. Active years: 1984-1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tadayoshi Kokubo. Retrieved from https://idiyas.com/inventor/tadayoshi-kokubo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 33

% Patents Active = 100.0

Average Co-Inventor Count = 3.1

ph-index = 13

Forward Citations = 445(Granted Patents)

Location History:

Kanagawa, JP (1984 - 1989)
Shizuoka, JP (1989 - 1996)
Shizuoka-ken, JP (1998)

Company Filing History:

33 out of 16,458

Fuji Photo Film Company, Limited

patents

1 out of 5,300

Nippon Telegraph and Telephone Corporation

patents

where one patent can have more than one assignee

Years Active: 1984-1998

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Areas of Expertise:

Positive Photoresist

Light-sensitive Composition

Novolak Resin

Micropattern-forming Material

Negative Photoresist

O-quinonediazide

Photographic Material

Developer

Silver Halide Emulsion

Heat-developable Material

Polyaromatic Hydroxy

Silsesquioxane Polymer

33 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 5707777 - Light-sensitive composition (1998-01-13),

2. 5576143 - Light-sensitive composition (1996-11-19),

3. 5576139 - Positive type photoresist composition comprising a novolak resin made (1996-11-19),

4. 5565300 - Positive photoresist composition (1996-10-15),

5. 5494773 - Positive photoresist composition comprising a novolak resin having a (1996-02-27),

6. 5429905 - Positive working photoresist composition containing naphthoquinone (1995-07-04),

7. 5389492 - Resist composition comprising a siloxane or silsesquioxane polymer (1995-02-14),

8. 5380618 - Micropattern-forming material having a low molecular weight novolak (1995-01-10),

9. 5360692 - Positive type 1,2-naphthoquinonediazide photoresist composition (1994-11-01),

10. 5340697 - Negative type photoresist composition (1994-08-23),

11. 5340688 - Positive type photoresist composition (1994-08-23),

12. 5340686 - Positive-type photoresist composition (1994-08-23),

13. 5324619 - Positive quinone diazide photoresist composition containing select (1994-06-28),

14. 5324618 - Positive type quinonediazide photoresist composition containing select (1994-06-28),

15. 5318875 - Positive quinonediazide photoresist composition containing select (1994-06-07),

Title: Tadayoshi Kokubo - Innovative Inventor from Shizuoka, JP

Introduction: Tadayoshi Kokubo is a renowned inventor hailing from Shizuoka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Tadayoshi Kokubo holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With over two decades of experience in the industry, Tadayoshi Kokubo has worked with leading research institutions and universities to develop cutting-edge technologies that have revolutionized various sectors.

Collaborations: Throughout his career, Tadayoshi Kokubo has collaborated with top companies, banks, and innovative startups to bring his inventions to the market, fostering a culture of creativity and progress.

Conclusion: Tadayoshi Kokubo's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor, shaping the future of technology and inspiring the next generation of inventors.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]