Itami, Japan

Nobuaki Kaneno


Average Co-Inventor Count = 2.5

ph-index = 8

Forward Citations = 1,193(Granted Patents)


Company Filing History:


Years Active: 1986-1998

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13 patents (USPTO):Explore Patents

Title: Innovations of Nobuaki Kaneno

Introduction

Nobuaki Kaneno is a prominent inventor based in Itami, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on enhancing the efficiency and performance of semiconductor devices.

Latest Patents

One of Kaneno's latest patents is a substrate holder for Metal-Organic Chemical Vapor Deposition (MOCVD). This innovative substrate holder supports a wafer during crystal growth and includes a molybdenum holder body. It features a GaAs polycrystalline film and an InP polycrystalline film, both grown to a specific thickness at elevated temperatures. This design stabilizes the emissivity of the substrate holder, reducing variations in the composition of the grown crystal. Another notable patent is for a semiconductor laser device that incorporates a quantum well structure. This device is designed to achieve low threshold current and high efficiency by applying tensile strain to the well layer, resulting in high-power output.

Career Highlights

Nobuaki Kaneno is associated with Mitsubishi Denki Kabushiki Kaisha, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and effective.

Collaborations

Kaneno has collaborated with notable coworkers such as Hitoshi Tada and Hirotaka Kizuki. Their combined expertise has contributed to the successful development of various semiconductor technologies.

Conclusion

Nobuaki Kaneno's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative designs continue to influence the industry and pave the way for future advancements.

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