This inventor holds 1 USPTO granted patent. Top assignee: Sharp Kabushiki Kaisha Corporation. Active years: 1996.
Company Filing History:
Years Active: 1996
Title: Noboru Ootani: Innovator in Dielectric Thin Film Technology
Introduction
Noboru Ootani is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of dielectric thin film devices. His innovative work has led to the development of advanced materials that enhance electronic device performance.
Latest Patents
Ootani holds a patent for a dielectric thin film device utilizing lead erbium zirconate titanate. This device is constructed with a dielectric thin film represented by (Pb.sub.1-y Er.sub.y) (Zr.sub.x Ti.sub.1-x)O.sub.3, which exhibits excellent electric characteristics, including low leakage current and improved fatigue resistance. The manufacturing process involves coating a substrate with a precursor solution, followed by high-temperature drying and thermal treatment to produce the dielectric thin film.
Career Highlights
Noboru Ootani is associated with Sharp Kabushiki Kaisha Corporation, where he has made significant strides in material science and engineering. His work has been instrumental in advancing the capabilities of dielectric materials in electronic applications.
Collaborations
Ootani has collaborated with notable colleagues, including Yoshiyuki Masuda and Yasushi Ogimoto, to further enhance the research and development of dielectric thin film technologies.
Conclusion
Noboru Ootani's innovative contributions to dielectric thin film technology have positioned him as a key figure in the field. His patent and collaborative efforts continue to influence advancements in electronic materials.