Noboru Mori

Title: The Innovative Journey of Noboru Mori

Introduction

Noboru Mori, an esteemed inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor manufacturing. With a total of two patents to his name, Mori's inventions reflect cutting-edge techniques that enhance the efficiency and functionality of semiconductor devices.

Latest Patents

One of Noboru Mori's latest patents is a groundbreaking method of manufacturing semiconductor devices that utilizes both a normal photomask and a phase shift mask for defining interconnect patterns. According to one embodiment of this invention, the manufacturing process involves several crucial steps. Initially, a phase shift mask and a normal photomask are prepared. A first wiring layer is then stacked on a semiconductor substrate, followed by a second wiring layer that comprises both a second wiring and a third wiring. Subsequently, an interlayer insulating film is applied to the second wiring layer. Using photolithography with the normal photomask, openings are formed in the interlayer insulating film to expose the second and third wirings. The final steps involve burying metal in these openings and providing a pad overlaying them.

Career Highlights

Noboru Mori has worked with prominent companies in the semiconductor industry, notably including Renesas Electronics Corporation and Renesas Technology Corporation. His experience in these organizations has contributed to his expertise in semiconductor device manufacturing and innovation.

Collaborations

Throughout his career, Mori has collaborated with notable colleagues, including Tatsuo Kasaoka and Kiyohiko Sakakibara. These collaborations have fostered the exchange of ideas and further propelled advancements in semiconductor technology.

Conclusion

Noboru Mori's contributions to the semiconductor industry through his inventive methods highlight his role as a trailblazer in this rapidly evolving field. With his patents paving the way for enhanced manufacturing techniques, Mori undoubtedly continues to influence the landscape of semiconductor innovation.