Noboru Furuichi

Title: Noboru Furuichi: Innovator in Semiconductor Manufacturing

Introduction

Noboru Furuichi is a distinguished inventor based in Kanagawa, Japan. He is known for his significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in the production of single crystal semiconductors.

Latest Patents

Furuichi holds a patent for a "Method for manufacturing single crystal semiconductor." This method aims to reduce impurity concentration nonuniformity within a semiconductor wafer plane, thereby improving wafer planarity. The technique involves introducing impurities more uniformly during the pulling of the single crystal semiconductor from a melt. By adjusting the rotating velocity of the semiconductor being pulled and applying a magnetic field of a specific strength, the process enhances the quality of the semiconductor. The crystal peripheral velocity is particularly crucial, with optimal adjustments leading to improved results.

Career Highlights

Noboru Furuichi is associated with Komatsu Denshi Kinzoku Kabushiki Kaisha, where he has made significant strides in semiconductor technology. His work has been instrumental in advancing the methods used in the industry, contributing to the overall efficiency and effectiveness of semiconductor production.

Collaborations

Furuichi has collaborated with notable colleagues, including Masafumi Ura and Hidetoshi Kurogi. Their combined expertise has fostered an environment of innovation and progress within their field.

Conclusion

Noboru Furuichi's contributions to semiconductor manufacturing exemplify the impact of innovative thinking in technology. His patented methods continue to influence the industry, showcasing the importance of research and development in advancing modern technology.