Company Filing History:
Years Active: 2015
Title: Innovator Nitika Goel: Pioneering Epitaxial Film Technology in Austin, TX
Introduction
Nitika Goel, an accomplished inventor based in Austin, TX, is making significant contributions to the field of semiconductor technology. As a member of the team at Intel Corporation, she has recently been recognized for her innovative work, resulting in the grant of a valuable patent.
Latest Patents
Nitika holds one patent for her invention titled "Epitaxial film on nanoscale structure." This groundbreaking invention features an epitaxial layer that is designed to directly contact a nanowire, fin, or pillar. The innovative structure allows the epitaxial layer to relax with two or three degrees of freedom, facilitating enhanced performance in electronic components. Notably, this layer may be integrated into the channel region of a transistor. An exciting aspect of her invention is the ability to remove the nanowire, fin, or pillar, which provides greater access to the epitaxial layer, ultimately leading to an all-around gate structure that surrounds the epitaxial layer completely.
Career Highlights
Nitika Goel's journey in the world of innovation has been marked by her dedication to advancing semiconductor technology. Her role at Intel Corporation has provided her with the platform to transform her creative ideas into functional technologies with impactful applications. With a keen focus on developing solutions that enhance electronic devices, she is carving a niche for herself within the research and development landscape.
Collaborations
In her quest for innovation, Nitika collaborates with talented colleagues, including Benjamin Chu-King and Van H Le. Together, they foster a collaborative environment focused on pushing the boundaries of technology and driving new developments in their field. These partnerships are essential in catalyzing progress and refining ideas into patentable inventions.
Conclusion
Nitika Goel is an inspiring figure in the realm of inventions and patents, exemplifying the spirit of innovation within the technology sector. Her work on epitaxial films and nanoscale structures is a testament to her role as a forward-thinking inventor at Intel Corporation. As she continues to explore new frontiers in semiconductor design, the impacts of her innovations will undoubtedly be felt across various applications in the tech industry.