This inventor holds 1 USPTO granted patent. Top assignee: Dalian University of Technology. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: Ning Huang - Innovator in Nanometer Cutting Technology
Introduction
Ning Huang is a prominent inventor based in Liaoning, China. He has made significant contributions to the field of nanotechnology, particularly in the development of advanced testing devices. His innovative work has garnered attention in both academic and industrial circles.
Latest Patents
Ning Huang holds a patent for a "Nanometer cutting depth high-speed single-point scratch test device and test method thereof." This device includes a workbench, an air-bearing turntable, a test piece fixture, a test piece, a Z-direction feeding device, a nano positioning stage, a force sensor, and a scratch tool. The invention allows for the machining of a micro convex structure with controllable length and height in a specific position of the test piece to be scratched. This advancement is crucial for precise material testing at the nanoscale.
Career Highlights
Ning Huang is affiliated with Dalian University of Technology, where he continues to engage in research and development. His work not only enhances the understanding of material properties but also paves the way for innovations in various engineering applications. With 1 patent to his name, he exemplifies the spirit of innovation in academia.
Collaborations
Ning Huang collaborates with notable colleagues, including Ying Yan and Renke Kang. Their combined expertise fosters a dynamic research environment that encourages the exploration of new ideas and technologies.
Conclusion
Ning Huang's contributions to nanotechnology through his innovative patent demonstrate his commitment to advancing the field. His work at Dalian University of Technology and collaborations with esteemed colleagues highlight the importance of teamwork in driving technological progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile