Espoo, Finland

Nina Pirilä


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Nina Pirilä: Innovator in Low Dielectric Constant Structures

Introduction

Nina Pirilä, based in Espoo, Finland, is an innovative inventor recognized for her contributions to the field of dielectric materials. Her work focuses on developing methods to create structures with low dielectric constants, which are of significant importance in various electronic applications.

Latest Patents

Nina holds a notable patent for "A method of forming a low dielectric constant structure." This innovative method includes providing a dielectric material with a specific dielectric constant and elastic modulus at a first temperature. She employs a thermal curing process, during which the material's temperature is raised at an average rate of at least 1°C per second. The result of this meticulous process is a densified dielectric material characterized by a low dielectric constant, enhancing the performance of electronic devices.

Career Highlights

Nina Pirilä is currently employed at Silecs Oy, a company specializing in advanced materials and technologies for electronics. Through her role, she applies her knowledge in materials science to develop innovative solutions that address the growing demands of the electronics industry. Her creative approach has solidified her reputation as a valuable contributor in her field.

Collaborations

Throughout her career, Nina has collaborated with talented professionals, including Jason S. Reid and Nigel Hackera. These collaborations have facilitated the exchange of ideas and fostered innovative research in the development of advanced dielectric materials.

Conclusion

Nina Pirilä exemplifies the spirit of innovation through her groundbreaking work in low dielectric constant structures. Her patent reflects her commitment to advancing technology in the electronics sector. As she continues her work at Silecs Oy, her contributions will undoubtedly inspire future developments in the realm of materials science.

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