Uppsala, Sweden

Nils Lundberg

This inventor holds 1 USPTO granted patent. Top assignee: Abb Research Ltd.. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nils Lundberg. Retrieved from https://idiyas.com/inventor/nils-lundberg-4wdazl7f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 63(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Nils Lundberg: Innovator in Schottky Diode Technology

Introduction

Nils Lundberg is a notable inventor based in Uppsala, Sweden. He has made significant contributions to the field of semiconductor technology, particularly with his work on Schottky diodes.

Latest Patents

Lundberg holds a patent for a Schottky diode of silicon carbide (SiC) and a method for its production. This innovative diode features a substrate layer, a drift layer, and emitter layer regions formed within the drift layer. A metal layer establishes an ohmic contact to the emitter layer regions and a Schottky contact to the drift layer. Notably, the design allows for a depletion of the drift layer region between two adjacent emitter layer regions in the blocking state of the diode, creating a continuous depleted region in this state.

Career Highlights

Nils Lundberg is associated with Abb Research Ltd., where he continues to advance his research and development efforts in semiconductor technologies. His work has been instrumental in enhancing the performance and efficiency of electronic devices.

Collaborations

Lundberg has collaborated with notable colleagues, including Willy Hermansson and Bo Bijlenga, contributing to various projects and innovations in the field.

Conclusion

Nils Lundberg's contributions to the development of Schottky diodes exemplify his innovative spirit and dedication to advancing semiconductor technology. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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