Villach, Austria

Nilesha Mishra

This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nilesha Mishra. Retrieved from https://idiyas.com/inventor/nilesha-mishra

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Nilesha Mishra: Innovator in Semiconductor Manufacturing

Introduction

Nilesha Mishra is a prominent inventor based in Villach, Austria. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for manufacturing semiconductor devices.

Latest Patents

Nilesha holds 1 patent for his invention titled "Method of manufacturing a semiconductor device." This method involves processing a semiconductor body at its first surface and attaching it to a carrier. The carrier consists of an inner part and an outer part that partially surrounds the inner part. The process continues with further processing at the second surface, which is opposite to the first surface. Finally, the inner part of the carrier is detached from the semiconductor body, showcasing a novel approach to semiconductor manufacturing.

Career Highlights

Nilesha Mishra is currently employed at Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in the industry.

Collaborations

Nilesha collaborates with Bernhard Goller, a fellow professional in the field. Their partnership exemplifies the importance of teamwork in driving innovation and achieving technological breakthroughs.

Conclusion

Nilesha Mishra's contributions to semiconductor manufacturing highlight his role as an influential inventor. His patented method represents a significant advancement in the field, and his work at Infineon Technologies AG continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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