Nilay Saha

Title: Inventor Spotlight: Nilay Saha

Introduction:

Nilay Saha is an innovative inventor based in Eindhoven, Netherlands, with a remarkable talent for creating groundbreaking technologies in the field of lithography. With a keen eye for detail and a passion for problem-solving, Nilay has made significant contributions to the industry through his unique inventions.

Latest Patents:

Nilay Saha holds 1 patent for his pioneering work in the development of a Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process. This patent involves scanning a scan range of the substrate with a sensor, measuring the intensity of radiation reflected from different substrate areas, and analyzing variations in order to identify defects in the substrate.

Career Highlights:

Currently employed at ASML Netherlands B.V., a leading technological company in the Netherlands, Nilay Saha continues to push the boundaries of innovation in the field of lithography. His dedication to improving processes and finding creative solutions has earned him recognition among his peers and in the industry.

Collaborations:

Nilay Saha has had the opportunity to collaborate with colleagues and industry experts, including his coworker Hermen Folken Pen. Together, they have worked on projects that have further advanced the field of lithography and solidified their reputation as innovators in their respective roles.

Conclusion:

In conclusion, Nilay Saha stands out as a talented inventor with a passion for discovering new solutions and pushing the limits of technology in lithography. His patent and contributions to the industry showcase his dedication to creating innovative solutions that have a lasting impact on the field.