New York, NY, United States of America

Nikolas Kaprinidis

USPTO Granted Patents = 8 


 

Average Co-Inventor Count = 2.0

ph-index = 4

Forward Citations = 63(Granted Patents)


Location History:

  • New York City, NY (US) (2006)
  • New York, NY (US) (2006 - 2012)

Company Filing History:


Years Active: 2006-2012

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8 patents (USPTO):

Title: The Innovative Contributions of Nikolas Kaprinidis

Introduction

Nikolas Kaprinidis is a prominent inventor based in New York, NY (US), known for his significant contributions to the field of polymer chemistry. With a total of 8 patents to his name, he has developed innovative solutions that enhance the performance and safety of various materials.

Latest Patents

Among his latest patents, Kaprinidis has developed a scratch-resistant polypropylene. This invention includes a polypropylene substrate combined with an alpha, beta-unsaturated carboxylic reagent functionalized olefin polymer or copolymer, a fatty acid amide, and a nucleating agent. The method he disclosed provides scratch resistance to polypropylene molded parts, which are particularly suitable for automotive applications. Additionally, he has created flame retardant compositions that incorporate melamine polyphosphate and poly(m-phenylene methylphosphonate) into polymer compositions. These compositions are applicable in epoxy resins for coatings and printed circuit boards, as well as in thermoplastics used for fibers and films.

Career Highlights

Kaprinidis has worked with notable companies such as Ciba Specialty Chemicals Corporation and Ciba Corporation. His experience in these organizations has allowed him to refine his expertise in polymer technology and innovation.

Collaborations

Some of his coworkers include Nicola Lelli and Hui Chin, who have contributed to his projects and advancements in the field.

Conclusion

Nikolas Kaprinidis continues to make impactful contributions to polymer science through his innovative patents and collaborations. His work not only enhances material properties but also addresses critical safety concerns in various applications.

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