The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Jun. 20, 2002
Applicants:
Hui Chin, Katonah, NY (US);
Peter Shelsey Solera, Suffern, NY (US);
Douglas Wayne Horsey, Briarcliff Manor, NY (US);
Nikolas Kaprinidis, New York City, NY (US);
Inventors:
Hui Chin, Katonah, NY (US);
Peter Shelsey Solera, Suffern, NY (US);
Douglas Wayne Horsey, Briarcliff Manor, NY (US);
Nikolas Kaprinidis, New York City, NY (US);
Assignee:
Ciba Specialty Chemicals Corporation, Tarrytown, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 5/3412 (2006.01); C08K 3/34 (2006.01);
U.S. Cl.
CPC ...
Abstract
Polymer compositions comprising a polymeric substrate and an effective stabilizing amount of a synergistic mixture of a nano-scaled filler and at least one additive selected from the group consisting of the hindered amine light stabilizers are effectively stabilized against the deleterious effects of oxidative, thermal or light-induced degradation.