Nicolas Gosset

Title: Nicolas Gosset: Innovator in 3D NAND Flash Memory Technologies

Introduction

Nicolas Gosset is a prominent inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for fabricating 3D NAND flash memory. His innovative approaches have the potential to enhance the efficiency and performance of memory storage solutions.

Latest Patents

Nicolas Gosset holds a patent for "Chemistries for etching multi-stacked layers." This patent discloses methods for fabricating 3D NAND flash memory. The method includes forming a hardmask pattern on the hardmask layer and using this pattern to create apertures in the alternating layers. This is achieved by selectively plasma etching the alternating layers versus the hardmask layer using a hydrofluorocarbon etching gas. The gases used include 1,1,1,3,3,3-hexafluoropropane (CHF), 1,1,2,2,3,3-hexafluoropropane (iso-CHF), 1,1,1,2,3,3,3-heptafluoropropane (CHF), and 1,1,1,2,2,3,3-heptafluoropropane (iso-CHF). The first etching layer comprises a material different from that of the second etching layer. He has 1 patent to his name.

Career Highlights

Nicolas Gosset is currently employed at L'Air Liquide, Société Anonyme Pour L'étude Et L'exploitation Des Procédés Georges Claude. His work at this esteemed company has allowed him to explore and develop advanced technologies in the semiconductor industry. His innovative contributions have positioned him as a key player in the field.

Collaborations

Nicolas has collaborated with notable colleagues, including Peng Shen and Keiichiro Urabe. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Nicolas Gosset is a distinguished inventor whose work in 3D NAND flash memory technologies is paving the way for advancements in memory storage solutions. His contributions to the field are invaluable and continue to influence the industry.