Hamden, CT, United States of America

Nicolai Petrov


Average Co-Inventor Count = 7.0

ph-index = 3

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2008-2009

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

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Title: Innovator Spotlight: Nicolai Petrov, Pioneering Inventor in Microelectronics

Introduction:

Nicolai Petrov is a prolific inventor based in Hamden, CT (US) who has made significant contributions to the field of microelectronics. With an impressive portfolio of five patents to his name, Petrov's innovative work has advanced the development of electroless deposition processes in microelectronic applications.

Latest Patents:

1. Defectivity and Process Control of Electroless Deposition in Microelectronics Applications - This patent focuses on methods and compositions for electrolessly depositing Co, Ni, or alloys onto substrates for manufacturing microelectronic devices.

2. Grain Refiners, Levelers, Oxygen Scavengers, and Stabilizers for Electroless Co and Ni Deposition Solutions - Petrov's invention provides essential components for enhancing the efficiency and quality of electroless deposition solutions in microelectronics.

Career Highlights:

Nicolai Petrov is a key member of the Enthone Incorporated team, where he continues to drive innovation and excellence in the field of microelectronics. His expertise in defectivity control and process optimization has positioned him as a leader in the industry, with his patented inventions helping to set new standards for microelectronic device manufacturing.

Collaborations:

Known for his collaborative spirit, Petrov has worked closely with esteemed colleagues such as Charles Valverde and Qingyun Chen. Together, they have pushed the boundaries of technology and furthered the development of cutting-edge solutions in the microelectronics sector.

Conclusion:

In conclusion, Nicolai Petrov stands out as a visionary inventor whose groundbreaking work in microelectronics has paved the way for advancements in process control, defectivity management, and deposition solutions. His dedication to innovation and collaboration continues to shape the future of the industry, making him a true pioneer in his field.

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