Eindhoven, Netherlands

Nicolaas H Van Stiphout

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicolaas H Van Stiphout. Retrieved from https://idiyas.com/inventor/nicolaas-h-van-stiphout

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Nicolaas H Van Stiphout: Innovator in Material Flow Control

Introduction

Nicolaas H Van Stiphout is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of material flow control, particularly through his innovative patent. His work is recognized for its practical applications in various systems, including those used for the deposition of materials.

Latest Patents

Van Stiphout holds a patent for a "Device for interrupting a material flow." This device features a shutter fastened on a spindle, which is rotatably supported in a housing. The design includes a torsion spring that stores mechanical energy through elastic deformation. The device effectively interrupts the material flow during operation, allowing for precise control over the deposition process.

Career Highlights

He is associated with U.S. Philips Corporation, where he has contributed to advancements in technology and innovation. His patent demonstrates a deep understanding of mechanical systems and their applications in material science.

Collaborations

Some of his notable coworkers include Poul K Larsen and Evert M Kamerbeek. Their collaborative efforts have likely contributed to the success of various projects within the company.

Conclusion

Nicolaas H Van Stiphout's work exemplifies the spirit of innovation in material flow control. His contributions continue to influence the field and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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