Ventura, CA, United States of America

Nicholas Fasanella


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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2 patents (USPTO):Explore Patents

Title: Innovations of Nicholas Fasanella

Introduction

Nicholas Fasanella is an accomplished inventor based in Ventura, California. He has made significant contributions to the field of technology, particularly through his innovative patents. With a total of 2 patents, Fasanella has demonstrated his expertise and creativity in developing advanced systems.

Latest Patents

Fasanella's latest patents include the "Deployable panel array and related assemblies and methods." This invention features a panel array and an associated deployment system that incorporates a first cable extending along a first row of panels, coupled to each panel in that row. Additionally, it includes a second cable for a second row of panels, creating a comprehensive deployment mechanism. Another notable patent is the "Wideband reflectarray using electrically re-focusable phased array feed." This planar reflectarray system enhances bandwidth by utilizing a tunable feed array that adjusts in amplitude and phase to correct for aberrations, thereby improving performance at various frequencies.

Career Highlights

Fasanella is currently employed at Northrop Grumman Systems Corporation, where he continues to push the boundaries of innovation. His work at this leading aerospace and defense technology company allows him to apply his inventive skills to real-world applications.

Collaborations

Throughout his career, Fasanella has collaborated with talented individuals such as Michael E. Cooley and Bret J. Yon. These partnerships have likely contributed to the success of his projects and patents.

Conclusion

Nicholas Fasanella is a notable inventor whose work has significantly impacted technology through his innovative patents. His contributions to the field exemplify the spirit of invention and the pursuit of advancement in engineering.

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