Dublin, Ireland

Niall Stobie

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2010.


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Niall Stobie: Innovator in Electronic Component Manufacturing

Introduction

Niall Stobie is a notable inventor based in Dublin, Ireland. He has made significant contributions to the field of electronic components, particularly through his innovative patent. His work focuses on methods and apparatus for forming electronic components with at least one N- or P-doped portion.

Latest Patents

Niall Stobie holds a patent for "Methods and apparatus to form electronic components with at least one N- or P-doped portion." This patent describes a method of manufacturing an electronic component that includes co-depositing inorganic semi-conducting nanoparticles and dopants on a substrate. The nanoparticles, which can be silicon or germanium, are fused by heating to create a continuous layer, followed by recrystallization of the layer. This innovative approach enhances the efficiency and performance of electronic components.

Career Highlights

Niall Stobie is currently employed at Hewlett-Packard Development Company, L.P. His role at this prestigious company allows him to apply his expertise in electronic component manufacturing. His contributions have been instrumental in advancing the technology used in various electronic devices.

Collaborations

Niall has collaborated with talented coworkers such as Paul Colfer and Lorraine Byrne. Their combined efforts have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Niall Stobie is a distinguished inventor whose work in electronic component manufacturing has led to significant advancements in the field. His patent reflects his commitment to innovation and excellence in technology.

Profile summary based on public USPTO records.
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