Company Filing History:
Years Active: 2008-2013
Title: The Innovative Contributions of Ni-Min Chung
Introduction
Ni-Min Chung is a notable inventor based in Nan-Tou Hsien, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of capacitor technologies. With a total of 2 patents to his name, Chung's work has had a considerable impact on the industry.
Latest Patents
Chung's latest patents focus on a method of manufacturing a capacitor deep trench and etching a deep trench opening. The process begins with a substrate that includes an oxide layer, a first nitride-silicon layer, a shallow trench isolation (STI), and a second nitride-silicon layer. A patterned poly-silicon layer on the second nitride-silicon layer is then etched to create a deep trench opening. This etching process not only forms the trench opening but also deepens it. Finally, a conductive layer is filled into the deep trench opening, enhancing the capacitor's performance.
Career Highlights
Ni-Min Chung is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His expertise in manufacturing processes has contributed to the advancement of capacitor technologies, making him a valuable asset to his organization.
Collaborations
Chung has collaborated with several talented individuals in his field, including Ta-Chuan Yeh and Kao-Su Huang. Their combined efforts have led to innovative solutions and improvements in semiconductor manufacturing techniques.
Conclusion
Ni-Min Chung's contributions to the field of semiconductor manufacturing, particularly through his patented methods, highlight his role as an influential inventor. His work continues to shape the future of capacitor technology and the broader semiconductor industry.