Yuseong, South Korea

Ngoc-Hung Nguyen

This inventor holds 1 USPTO granted patent. Top assignee: Mks Instruments, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ngoc-Hung Nguyen. Retrieved from https://idiyas.com/inventor/ngoc-hung-nguyen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Ngoc-Hung Nguyen: Innovator in Plasma Processing Systems

Introduction

Ngoc-Hung Nguyen is a notable inventor based in Yuseong, South Korea. He has made significant contributions to the field of plasma processing systems, particularly through his innovative patent. His work focuses on enhancing the performance and efficiency of RF power generators.

Latest Patents

Ngoc-Hung Nguyen holds a patent for "Demagnetizing coils for linearity improvement of current ratio of plasma processing systems." This invention involves a RF power generator that generates an output signal, which is then split into multiple signals. The demagnetizing circuit he developed includes several inductances that effectively reduce the effects of mutual impedance in an ICP chamber. This design ensures that the ratio between split signals varies linearly, improving the overall functionality of plasma processing systems.

Career Highlights

Nguyen is currently employed at MKS Instruments, Inc., where he continues to innovate and develop advanced technologies. His expertise in RF power systems has positioned him as a valuable asset in the field of plasma processing.

Collaborations

Nguyen has collaborated with talented colleagues, including Dinh-Vuong Le and Jaechul Jung, contributing to various projects and advancements in their field.

Conclusion

Ngoc-Hung Nguyen's contributions to plasma processing systems through his innovative patent demonstrate his commitment to advancing technology in this area. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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