Singapore, Singapore

Neoh Soon Ee

This inventor holds 1 USPTO granted patent. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Neoh Soon Ee. Retrieved from https://idiyas.com/inventor/neoh-soon-ee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Neoh Soon Ee and Semiconductor Manufacturing Innovation.

Introduction

Neoh Soon Ee is an inventor associated with Singapore and Chartered Semiconductor Manufacturing Ltd. His patent addresses how semiconductor manufacturing processes can be evaluated before new processing tools are installed.

Latest Patents

The available information identifies one patent for Neoh Soon Ee: “Methodology to Obtain Integrated Process Results Prior to Process Tools Being Installed.” The invention proposes dividing a semiconductor manufacturing facility’s processing tools into short loops or submodules, then combining and evaluating them progressively. This staged approach is intended to verify integrated process results before installation is complete and before the facility’s full processing loop is assembled. Neoh Soon Ee is credited with 1 patent.

Career Highlights

Neoh Soon Ee’s listed work is connected to Chartered Semiconductor Manufacturing Ltd, a semiconductor manufacturing company. His patent focuses on planning and validating process integration during the modification or updating of a semiconductor foundry.

Collaborations

The provided information lists Cheng Chor Shu and Johnny Cham as Neoh Soon Ee’s coworkers. It does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Neoh Soon Ee’s patent presents a gradual method for evaluating integrated semiconductor manufacturing processes before all processing tools are installed, highlighting an approach to managing foundry updates and equipment integration.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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