Company Filing History:
Years Active: 1994-1995
Title: Innovations of Neng H Shen in Semiconductor Technology
Introduction
Neng H Shen, a notable inventor based in Hsing-Chu, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, Shen focuses on advanced methods of local oxidation and device isolation structures, which are essential for enhancing semiconductor device performance and reliability.
Latest Patents
Shen's latest patents include innovative techniques such as "Planarized Local Oxidation by Trench-Around Technology." This invention outlines a new planarized device isolation structure within a semiconductor substrate. The device isolation structure consists of narrow regions featuring deep trenches with thin oxide coverings and silicon oxide fillings. Additionally, the wide device isolation regions are defined by two deep trenches that flank a shallow trench, all carefully designed to optimize the electrical isolation in semiconductor devices. The top surface of these regions is planarized to ensure consistent device performance.
Another significant patent by Shen details a method of local oxidation utilizing trench-around technology. In this process, a first silicon oxide layer is deposited on a silicon substrate and is selectively etched to create wide and narrow openings. This method also incorporates silicon nitride spacers to facilitate the formation of deep trenches that are filled with silicon oxide, ultimately growing field oxide regions within shallow trenches. These advancements showcase Shen's expertise and innovative approach to semiconductor fabrication.
Career Highlights
Neng H Shen is currently associated with United Microelectronics Corporation, where he applies his knowledge in semiconductor technologies to drive innovation. His work has led to advancements that significantly enhance device isolation and miniaturization, making him a valuable asset to the company and the industry as a whole.
Collaborations
Throughout his career, Shen has collaborated with talented coworkers, including Water Lur and Anna Su. These partnerships have fostered an environment of innovation, leading to the development of groundbreaking technologies in the semiconductor industry.
Conclusion
In conclusion, Neng H Shen is a distinguished inventor whose contributions to semiconductor technology through his patents are noteworthy. His work not only reflects his ingenuity but also serves as a foundation for future innovations in device isolation and fabrication methods, solidifying his reputation within the industry.