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Years Active: 2014-2015
Title: Neil Zhao: Innovator in Transistor Technology
Introduction
Neil Zhao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of transistors. With a total of four patents to his name, Zhao's work has advanced the understanding and fabrication of transistor devices.
Latest Patents
Neil Zhao's latest patents include innovative methods for fabricating transistors. One of his notable patents describes a method for fabricating a transistor that involves providing a semiconductor substrate and forming a trench in the substrate through etching. This method also includes the formation of a threshold-adjusting layer doped with specific ions to modify the threshold voltage of the transistor. Additionally, he has developed a transistor device that enhances carrier mobility by utilizing a confining layer to manage impurity ions and forming an epitaxial silicon layer on top.
Career Highlights
Throughout his career, Neil Zhao has worked with leading companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corp. and Semiconductor Manufacturing International (Shanghai) Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in transistor technology.
Collaborations
Neil Zhao has collaborated with various professionals in his field, including Mieno Fumitake. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Neil Zhao's contributions to transistor technology have positioned him as a key figure in the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing technology in this critical field.