Neil Troy

Title: Neil Troy - Innovator in Defect Detection Technology

Introduction

Neil Troy is a prominent inventor based in San Jose, California. He has made significant contributions to the field of defect detection technology, particularly in the lithography process used in semiconductor manufacturing. His innovative approach has led to the development of systems and methods that enhance the accuracy of defect detection on reticles.

Latest Patents

Neil Troy holds a patent for a groundbreaking invention titled "Print Check Repeater Defect Detection." This patent outlines systems and methods for detecting defects on a reticle. The system includes computer subsystems designed to perform repeater defect detection steps during the inspection process of a wafer. The process involves identifying defects in corresponding locations across multiple test images, utilizing techniques such as double detection and stacked defect detection. This invention aims to improve the reliability of defect identification, ultimately enhancing the quality of semiconductor manufacturing.

Career Highlights

Throughout his career, Neil has demonstrated a commitment to innovation and excellence in his field. His work at Kla Corporation has positioned him as a key player in the development of advanced defect detection technologies. With a focus on improving manufacturing processes, Neil's contributions have had a lasting impact on the industry.

Collaborations

Neil Troy has collaborated with notable colleagues, including Hong Chen and Kenong Wu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology in defect detection.

Conclusion

Neil Troy's innovative work in defect detection technology exemplifies the importance of advancements in the semiconductor industry. His patent and contributions at Kla Corporation highlight his role as a leading inventor in this critical field.