Skillman, NJ, United States of America

Neena Tierney

This inventor holds 1 USPTO granted patent. Top assignee: Kenvue Brands LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Neena Tierney. Retrieved from https://idiyas.com/inventor/neena-tierney-y7wjjpno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Neena Tierney: Innovator in Facial Treatment Effectiveness

Introduction

Neena Tierney is a notable inventor based in Skillman, NJ (US). She has made significant contributions to the field of facial treatment effectiveness through her innovative patent. Her work focuses on improving the assessment of treatment outcomes for facial care.

Latest Patents

Neena Tierney holds a patent for a method of determining the effectiveness of a treatment on a face. This patent outlines a systematic approach that includes providing a front-facing image of the face prior to treatment, identifying key facial axes, selecting facial landmarks, and measuring angles to assess treatment effectiveness. The process culminates in capturing a post-treatment image to evaluate results.

Career Highlights

Neena is currently employed at Kenvue Brands LLC, where she applies her expertise in developing effective facial treatments. Her innovative approach has positioned her as a valuable asset in her field.

Collaborations

Neena collaborates with talented coworkers, including Brenda Edison and Thomas Shyr, who contribute to her projects and enhance the innovation process.

Conclusion

Neena Tierney's work exemplifies the intersection of innovation and practical application in the beauty industry. Her patent for assessing facial treatment effectiveness showcases her commitment to advancing skincare solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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