Corvallis, OR, United States of America

Neel Banerjee

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 67(Granted Patents)


Location History:

  • Coravllis, OR (US) (2016)
  • Corvallis, OR (US) (2012 - 2019)

Company Filing History:


Years Active: 2012-2019

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12 patents (USPTO):Explore Patents

Title: Neel Banerjee: Innovator in Ink Level Sensing Technology

Introduction

Neel Banerjee is a prominent inventor based in Corvallis, Oregon, known for his significant contributions to ink level sensing technology. With a total of 12 patents to his name, Banerjee has made a notable impact in the field of electronics and sensor technology.

Latest Patents

Among his latest innovations, Banerjee has developed methods and devices for ink level sensing. One of his patents describes a method that involves applying a pre-charge voltage to a sense capacitor, which charges the capacitor and shares the charge with a reference capacitor. This process allows for the determination of a resistance from a drain to a source of an evaluation transistor based on the reference voltage. Another patent outlines an ink level sensor that includes a sense capacitor connected to ground, along with switches to couple voltages and share charges, ultimately providing a drain to source resistance proportional to the second voltage.

Career Highlights

Banerjee is currently employed at Hewlett-Packard Development Company, L.P., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of ink level sensing, which is crucial for various printing applications.

Collaborations

Throughout his career, Banerjee has collaborated with notable colleagues, including Andrew L. Van Brocklin and Ning Ge. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Neel Banerjee's work in ink level sensing technology exemplifies his dedication to innovation and excellence in the field. His contributions continue to influence the industry and pave the way for future advancements.

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