Bengaluru, India

Neeharika Adabala

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Microsoft Technology Licensing, LLC. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Neeharika Adabala. Retrieved from https://idiyas.com/inventor/neeharika-adabala

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 66.7

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2012

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3 patents (USPTO):Explore Patents

Title: **Innovative Insights by Neeharika Adabala: Pioneering Patents from Bengaluru**

Introduction

Neeharika Adabala, an accomplished inventor based in Bengaluru, India, has made significant contributions to the field of technology with her innovative patents. With a total of three granted patents, Neeharika has focused her efforts on developing solutions that address real-world problems, particularly in the realm of image processing and occlusion reduction.

Latest Patents

Her most recent patent, titled "Reducing Occlusions in Oblique Views," presents an advanced occlusion reduction system. This system aims to minimize occlusions when displaying multiple objects by calculating an occlusion measure and employing functional dynamics techniques. These techniques enable the movement of objects, the partial transparency of objects, and the alteration of object scales to enhance visibility. The system also constructs a geometric model based on incoming modeling information, establishes a viewpoint, analyzes a selected set of objects, and computes the occlusion measure for efficient visualization.

Another notable invention is "Image-Guided Abstraction of Building Facades," which aims to reduce storage space and computational demands when rendering image data, especially for buildings. The patent outlines a process for extracting primary and secondary colors from image data, allowing for a re-rendering that utilizes significantly less data while preserving essential patterns. This innovative approach leverages bi-level data evaluation and the Discrete Fourier Transform (DFT) to create a highly efficient abstraction that can be three to four orders of magnitude smaller than the original.

Career Highlights

Neeharika currently works at Microsoft Technology Licensing, LLC, where her innovative spirit and technical expertise drive the development of advanced technologies. Her work not only showcases her creativity but also highlights her commitment to improving data visualization and processing.

Collaborations

Throughout her career, Neeharika has collaborated with notable figures in the industry, including Kentaro Toyama and Aniruddha Loya. These collaborations have fostered an environment of innovation and exploration, allowing her to push the boundaries of technology effectively.

Conclusion

With her impressive portfolio of patents and contributions to image processing technology, Neeharika Adabala stands out as a prominent inventor in her field. Her work continues to influence advancements in occlusion reduction and image abstraction, showcasing the vital role of inventors in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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