The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Jan. 29, 2007
Neeharika Adabala, Bangalore, IN;
Kentaro Toyama, Bangalore, IN;
Neeharika Adabala, Bangalore, IN;
Kentaro Toyama, Bangalore, IN;
Microsoft Corporation, Redmond, WA (US);
Abstract
An occlusion reduction system is described. The occlusion reduction system can reduce occlusions when displaying multiple objects by computing an occlusion measure and applying one or more functional dynamics techniques to minimize the occlusion measure, such as by moving objects, making objects at least partially transparent, and altering the scale of objects. The occlusion reduction system can create a geometric model based on modeling information it receives, establish a viewpoint, identify a set of objects for analysis, and compute an occlusion measure for the identified set of objects.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile