San Jose, CA, United States of America

Nedal Saleh

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nedal Saleh. Retrieved from https://idiyas.com/inventor/nedal-saleh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Nedal Saleh

Introduction

Nedal Saleh is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of optical metrology, particularly in the analysis of substrates and films. His innovative work has led to the development of a patented technology that enhances the quality assessment of various materials.

Latest Patents

Nedal Saleh holds a patent for "Phase-resolved optical metrology for substrates." This invention provides methods and apparatus for determining the qualities of a substrate and the films applied to it. By coupling transmitted and reflected signals using both amplitude and phase information, his technology improves the metrology information obtained from film layers on the substrate.

Career Highlights

Nedal Saleh is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his expertise in optical metrology to real-world applications, contributing to advancements in technology and manufacturing processes.

Collaborations

Throughout his career, Nedal has collaborated with notable colleagues, including Zhiming Jiang and Xiaodong Zhang. These partnerships have fostered innovation and have been instrumental in the development of cutting-edge technologies in the field.

Conclusion

Nedal Saleh's contributions to optical metrology exemplify the impact of innovative thinking in technology. His patented methods enhance the quality assessment of substrates, showcasing the importance of precision in manufacturing. His work continues to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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