Ned J Chou

Title: The Innovative Contributions of Ned J Chou

Introduction

Ned J Chou is a notable inventor based in Yorktown Heights, NY. He has made significant contributions to the field of polymer technology and mask fabrication, holding a total of two patents. His work has implications in various industries, particularly in the development of advanced materials and semiconductor manufacturing.

Latest Patents

Ned J Chou's latest patents include a method for enhancing the adhesion of polymer surfaces by water vapor. This method involves water vapor plasma treating the surface of a polymer body to improve the adhesion between two polymer surfaces, with a particular focus on polyimide surfaces. Another significant patent is for high aspect ratio, high resolution mask fabrication. This invention describes a high aspect ratio collimating mask used in ion beam epitaxy or ion implantation doping, formed through damage-trail-forming materials that are irradiated and then etched. This mask is crucial for producing large-scale integrated circuits during the epitaxial growth of crystal wafers.

Career Highlights

Ned J Chou is currently associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore innovative solutions in technology and materials science. His patents reflect his commitment to advancing the field and addressing complex challenges in manufacturing processes.

Collaborations

Throughout his career, Ned has collaborated with esteemed colleagues, including Ronald Dean Goldblatt and John E Heidenreich, III. These collaborations have likely contributed to the innovative nature of his work and the successful development of his patents.

Conclusion

Ned J Chou's contributions to the fields of polymer technology and semiconductor manufacturing are noteworthy. His patents demonstrate a deep understanding of material science and its applications in modern technology. His work continues to influence advancements in these critical areas.