The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 1991
Filed:
Apr. 03, 1989
Applicant:
Inventors:
Ned J Chou, Yorktown Heights, NY (US);
Ronald D Goldblatt, Rye Brook, NY (US);
John E Heidenreich, III, Yorktown Heights, NY (US);
Steven E Molis, Yorktown Heights, NY (US);
Luis M Ferreiro, deceased, late of Bardonia, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; B29C / ; C03C / ; B32B / ;
U.S. Cl.
CPC ...
156643 ; 1562726 ; 1563071 ; 1563082 ; 156633 ; 156646 ; 20419236 ; 252 791 ; 427307 ; 427299 ; 427322 ; 4284735 ;
Abstract
Method for water vapor plasma treating the surface of a polymer body to enhance the adhesion of a first and second polymer surface. The method is particularly useful for polyimide surfaces.
Chou, Ned. (1991). Method for enhancing the adhesion of polymer surfaces by water vapor (U.S. Patent No. 5019210). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5019210
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile