Singapore, Singapore

Navabalachandran Jayabalan

This inventor holds 2 USPTO granted patents. Top assignee: Pratt & Whitney Services Pte Ltd.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Navabalachandran Jayabalan. Retrieved from https://idiyas.com/inventor/navabalachandran-jayabalan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

Average Co-Inventor Count = 1.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2012

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2 patents (USPTO):Explore Patents

Title: Innovations by Navabalachandran Jayabalan

Introduction

Navabalachandran Jayabalan is a notable inventor based in Singapore, SG. He has made significant contributions to the field of airfoil finishing technology. With a total of 2 patents, his work showcases innovative approaches to enhancing manufacturing processes.

Latest Patents

Jayabalan's latest patents include a "Masking method for edge profile finishing." This invention features a mask designed for high-speed media finishing on airfoils. The mask consists of a thicker portion and a thinner portion, with the thicker portion positioned further from the edge that will become the leading edge of the final airfoil. This design allows the media to be redirected by the thicker portion toward the edge where the finishing is to occur. Another patent, "Airfoil mask, airfoil and mask system," shares similar characteristics and aims to improve the efficiency of airfoil finishing processes.

Career Highlights

Navabalachandran Jayabalan is currently employed at Pratt & Whitney Services Pte Ltd. His role at this esteemed company allows him to apply his innovative ideas in practical settings, contributing to advancements in aerospace technology.

Conclusion

Navabalachandran Jayabalan's contributions to airfoil finishing technology through his patents reflect his expertise and commitment to innovation. His work continues to influence the aerospace industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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