The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Dec. 28, 2011
Applicant:
Navabalachandran Jayabalan, Singapore, SG;
Inventor:
Navabalachandran Jayabalan, Singapore, SG;
Assignee:
Pratt & Whitney Services PTE Ltd, Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01); B21D 53/78 (2006.01);
U.S. Cl.
CPC ...
Abstract
A mask for performing high speed media finishing on airfoils includes a thicker portion and a thinner portion. The thicker portion is spaced further from an edge that will become a leading edge in the final airfoil than the thinner portion. The media is redirected by the thicker portion toward the edge where the finishing is to occur.
Jayabalan, Navabalachandran. (2012). Masking method for edge profile finishing (U.S. Patent No. 8308526). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8308526
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile