This inventor holds 1 USPTO granted patent. Top assignee: Asm Japan K.k.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Nathan R C Kemeling: Innovator in Semiconductor Technology
Introduction
Nathan R C Kemeling is a notable inventor based in Tama, Japan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for forming interconnections in semiconductor devices.
Latest Patents
Nathan holds a patent for a method of forming interconnection in semiconductor devices. This patent describes a multilayer interconnection structure formed by several steps. These steps include forming a low dielectric constant film on a substrate, curing the film with UV light, laminating a UV blocking film, and curing the next low dielectric constant film with UV light. This innovative method enhances the performance and efficiency of semiconductor devices.
Career Highlights
Nathan is currently employed at Asm Japan K.K., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.
Collaborations
Nathan has collaborated with esteemed colleagues such as Kiyohiro Matsushita and Naoki Ohara. Their combined expertise has contributed to the success of various projects within the semiconductor industry.
Conclusion
Nathan R C Kemeling is a prominent figure in the semiconductor field, with a focus on innovative methods that improve device performance. His contributions and collaborations highlight the importance of teamwork in driving technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile