Company Filing History:
Years Active: 2001-2002
Title: Nathan J Kohler: Innovator in Mesoporous Film Technology
Introduction
Nathan J Kohler is a prominent inventor based in Richland, WA (US). He has made significant contributions to the field of materials science, particularly in the development of methods for creating mesoporous films. With a total of 2 patents to his name, Kohler's work is recognized for its innovative approaches and practical applications.
Latest Patents
Kohler's latest patents include a method of dehydroxylating a hydroxylated material and a method of making a mesoporous film. The first patent outlines a process for dehydroxylating a silica surface that is hydroxylated. This involves exposing the silica surface to a silicon organic compound and a dehydroxylating gas, typically at elevated temperatures. The method emphasizes improvements through repeated soaking and gas exposure, as well as the use of inert gases. The second patent focuses on creating a mesoporous silica film with a low dielectric constant. This process combines a surfactant with a silica precursor solution, followed by spin-coating and dehydroxylation to achieve a film with fine pores and excellent stability.
Career Highlights
Kohler is affiliated with the Battelle Memorial Institute, where he applies his expertise in materials science to advance research and development projects. His innovative methods have the potential to impact various industries, including electronics and materials engineering.
Collaborations
Kohler has collaborated with notable colleagues such as Jun Liu and Karel Domansky. These partnerships have fostered a collaborative environment that enhances the research and development of new technologies.
Conclusion
Nathan J Kohler is a distinguished inventor whose work in mesoporous film technology showcases his innovative spirit and dedication to advancing materials science. His contributions continue to influence the field and pave the way for future advancements.