Nasim Eibagi

Title: The Innovative Contributions of Nasim Eibagi

Introduction

Nasim Eibagi is a notable inventor based in Cibolo, Texas. He has made significant contributions to the field of materials science, particularly in the development of methods for carbon-based films. His innovative approach has led to the creation of a unique patent that enhances the efficiency of etching processes.

Latest Patents

Nasim Eibagi holds a patent for a "Self-limiting cyclic etch method for carbon-based films." This patent describes a cyclic etch method that involves several steps. The process begins with providing a substrate containing the carbon-based film. The carbon-based film is then exposed to an oxidizing plasma, which forms an oxidized layer on the film. Following this, the oxidized layer is exposed to a non-oxidizing inert gas plasma, which removes the oxidized layer and creates a carbonized surface layer on the film. This method can be repeated multiple times to achieve desired results. He has 1 patent to his name.

Career Highlights

Nasim Eibagi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work at this organization has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Throughout his career, Nasim has collaborated with talented individuals such as Barton Lane and Alok Ranjan. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Nasim Eibagi's contributions to the field of carbon-based films and etching methods highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and pave the way for future developments.