The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2021
Filed:
Nov. 08, 2017
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Barton G. Lane, Austin, TX (US);
Nasim Eibagi, Cibolo, TX (US);
Alok Ranjan, Austin, TX (US);
Peter L. G. Ventzek, Austin, TX (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31138 (2013.01); H01L 21/0276 (2013.01); H01L 21/02321 (2013.01); H01L 21/31144 (2013.01); H01L 22/12 (2013.01);
Abstract
Embodiments of the disclosure describe a cyclic etch method for carbon-based films. According to one embodiment, the method includes providing a substrate containing the carbon-based film, exposing the carbon-based film to an oxidizing plasma thereby forming an oxidized layer on the carbon-based film, thereafter, exposing the oxidized layer to a non-oxidizing inert gas plasma thereby removing the oxidized layer and forming a carbonized surface layer on the carbon-based film, and repeating the exposing steps at least once.