Dorchester, MA, United States of America

Narsmoul Karaya

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Rohm & Haas Electronic Materials LLC. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Narsmoul Karaya. Retrieved from https://idiyas.com/inventor/narsmoul-karaya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Narsmoul Karaya: Innovator in Copper Electroplating Methods

Introduction

Narsmoul Karaya is a notable inventor based in Dorchester, MA (US). He has made significant contributions to the field of electroplating, particularly with his innovative methods that enhance the quality of copper deposits.

Latest Patents

Narsmoul holds a patent for a low internal stress copper electroplating method. This method provides low internal stress copper deposits, which are crucial for various applications. The concentrations of accelerators in the copper electroplating bath vary as a function of the plating current density, resulting in a matt copper deposit that exhibits low internal stress.

Career Highlights

Narsmoul Karaya is currently employed at Rohm & Haas Electronic Materials LLC, where he continues to develop and refine electroplating techniques. His work has been instrumental in advancing the technology used in electronic materials.

Collaborations

Narsmoul collaborates with Gary Hamm, a coworker who shares his passion for innovation in the field of electroplating. Together, they contribute to the ongoing research and development efforts at their company.

Conclusion

Narsmoul Karaya's contributions to copper electroplating methods highlight his role as an innovator in the field. His patent and ongoing work at Rohm & Haas Electronic Materials LLC demonstrate his commitment to advancing technology in electronic materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…