Tokyo, Japan

Naritoshi Ozawa

This inventor holds 1 USPTO granted patent. Top assignee: Disco Corporation. Active years: 2002.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 63(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Naritoshi Ozawa: Innovator in Cleaning Technology

Introduction

Naritoshi Ozawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of cleaning technology, particularly through his innovative designs and patents. His work reflects a commitment to enhancing the efficiency and effectiveness of cleaning apparatuses.

Latest Patents

Ozawa holds a patent for a cleaning apparatus that features a nozzle with an ejection port. This apparatus includes a cleaning liquid path that communicates with the ejection port, as well as a compressed gas path. The design allows for the simultaneous ejection of cleaning liquid and compressed gas, optimizing the cleaning process. This patent showcases his ingenuity in combining different elements to create a more effective cleaning solution. He has 1 patent to his name.

Career Highlights

Naritoshi Ozawa is associated with Disco Corporation, where he has been instrumental in developing advanced cleaning technologies. His role at the company has allowed him to apply his innovative ideas in practical applications, contributing to the company's reputation in the industry.

Collaborations

Throughout his career, Ozawa has collaborated with talented individuals such as Xiaoming Qiu and Satoshi Ohkawara. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Naritoshi Ozawa's contributions to cleaning technology through his patent and work at Disco Corporation highlight his role as an innovator in the field. His dedication to improving cleaning apparatuses demonstrates the impact of inventive thinking on everyday solutions.

Profile summary based on public USPTO records.
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