Tokyo, Japan

Nariaki Nawa

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Toppan Forms Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nariaki Nawa. Retrieved from https://idiyas.com/inventor/nariaki-nawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Nariaki Nawa: Innovator in Wiring Board Technology

Introduction

Nariaki Nawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of wiring board technology. His innovative approach has led to the development of a unique method for producing wiring boards that enhances performance and efficiency.

Latest Patents

Nawa holds a patent for a "Method for producing wiring board." This invention features thin silver wires formed on a substrate using a printing method. The thin silver wires are designed with a cross-sectional width of 20 µm or less. Additionally, the top of the wires has a smaller width than the contact portion that interfaces with the substrate. The volume resistivity of the thin silver wire is 15 µΩ·cm or less, showcasing its advanced electrical properties.

Career Highlights

Nariaki Nawa is associated with Toppan Forms Co., Ltd., a company known for its innovative solutions in printing and electronic components. His work at Toppan Forms has positioned him as a key player in the development of cutting-edge wiring technologies.

Collaborations

Nawa collaborates with talented individuals such as Kumi Hirose and Takuya Sekiguchi. Their combined expertise fosters an environment of innovation and creativity within their projects.

Conclusion

Nariaki Nawa's contributions to wiring board technology exemplify the spirit of innovation. His patented methods and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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