Narak Choi

Title: Innovations by Narak Choi

Introduction

Narak Choi is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of optical proximity correction, with a focus on enhancing the manufacturing processes of extreme ultraviolet masks. His innovative approaches have led to the development of several patents that are crucial for advancements in semiconductor technology.

Latest Patents

Narak Choi holds 3 patents, with his latest inventions focusing on optical proximity correction methods. One of his notable patents is an optical proximity correction method that effectively imitates a mask topography effect for masks with curvilinear patterns. This method involves generating a library for edge filters using electromagnetic field simulations and creating an any-angle edge filter. Another significant patent details an optical proximity correction method that extracts edges of a layout on a mask, including curvilinear edges, and generates an optical image by applying an edge filter.

Career Highlights

Narak Choi is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in semiconductor manufacturing. His work has been instrumental in improving the precision and efficiency of mask manufacturing processes.

Collaborations

Throughout his career, Narak has collaborated with talented individuals such as Dongwon Kang and Sangchul Yeo, contributing to a dynamic and innovative work environment.

Conclusion

Narak Choi's contributions to optical proximity correction and mask manufacturing are noteworthy. His patents reflect a deep understanding of the complexities involved in semiconductor technology. His ongoing work at Samsung Electronics Co., Ltd. continues to influence the industry positively.