Osaka, Japan

Naoyoshi Jinno


Average Co-Inventor Count = 5.2

ph-index = 4

Forward Citations = 63(Granted Patents)


Location History:

  • Ibaraki, JP (1979)
  • Osaka, JP (1981 - 1989)

Company Filing History:


Years Active: 1979-1989

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4 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Naoyoshi Jinno

Introduction: Naoyoshi Jinno, an esteemed inventor based in Osaka, Japan, has made significant contributions to the field of materials science through his innovative inventions. With a total of four patents to his name, Jinno has been instrumental in developing advanced photoresist compositions and coating materials that have broad industrial applications.

Latest Patents: Among his latest patents, one of the most notable is the "Positive Type High Gamma-Value Photoresist Composition with Novolak." This invention involves a positive photoresist composition that includes a novolak resin and an O-quinone diazide compound. The unique formulation ensures improved resolving power, showcasing an enhanced gamma-value, which is crucial for high-resolution lithography processes. In addition, Jinno has developed a "Coating Composition for Providing Water and Blister Resistant," which comprises a pigment and an aqueous binder, further refined by a mixture of reaction products that contribute to its durability and performance.

Career Highlights: Jinno’s career is marked by his association with the Sumitomo Chemical Company, Limited, where he has been a key player in research and development. His innovative spirit has not only led to technological advancements but also to patents that push the boundaries of current material capabilities.

Collaborations: Throughout his career, Jinno has collaborated with notable professionals such as Shigenao Kawakami and Shigeru Ura. These partnerships have fostered a creative environment that promotes the exchange of ideas and further enriches their collective contributions to the field.

Conclusion: Naoyoshi Jinno exemplifies the spirit of innovation within the chemical industry. His patents reflect a commitment to advancing technology through careful research and collaboration. As he continues to push the envelope with his inventions, the impact of his work will undoubtedly resonate across various applications, enhancing material performance and reliability.

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