Location History:
- Yamaguchi, JP (2008)
- Chiba, JP (2006 - 2009)
Company Filing History:
Years Active: 2006-2009
Title: Naoyoshi Hatakeyama: Innovator in Adamantane Derivatives
Introduction
Naoyoshi Hatakeyama is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of chemistry, particularly in the development of adamantane derivatives. With a total of 6 patents to his name, Hatakeyama's work has implications in various industrial applications.
Latest Patents
Hatakeyama's latest patents focus on the synthesis and application of adamantane derivatives. One of his notable inventions is an adamantane derivative that provides a novel structure represented by specific general formulas. This invention outlines a process for producing adamantane derivatives through the reaction of an alcohol form of an adamantane compound with a sulfonyl compound. The resulting compounds are useful as monomers for functional resins, particularly in photolithography. Another patent describes an adamantane derivative that serves as a modifying agent for resins used in photoresists and as a dry etching resistance-improving agent. These innovations highlight the versatility and utility of adamantane derivatives in various fields, including agriculture and medicine.
Career Highlights
Throughout his career, Naoyoshi Hatakeyama has worked with notable companies such as Idemitsu Kosan Company, Limited and Idemitsu Petrochemical Co., Ltd. His experience in these organizations has contributed to his expertise in the development of chemical compounds and their applications.
Collaborations
Hatakeyama has collaborated with esteemed colleagues, including Shinji Tanaka and Hidetoshi Ono. These partnerships have fostered innovation and advancement in the field of chemistry.
Conclusion
Naoyoshi Hatakeyama's contributions to the development of adamantane derivatives demonstrate his significant impact on the field of chemistry. His innovative patents and collaborations reflect his dedication to advancing industrial applications.