The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
Feb. 01, 2005
Naoyoshi Hatakeyama, Chiba, JP;
Shinji Tanaka, Chiba, JP;
Hidetoshi Ono, Chiba, JP;
Yasunari Okada, Chiba, JP;
Naoyoshi Hatakeyama, Chiba, JP;
Shinji Tanaka, Chiba, JP;
Hidetoshi Ono, Chiba, JP;
Yasunari Okada, Chiba, JP;
Idemitsu Kosan Co., Ltd., Tokyo, JP;
Abstract
The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl(meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.