The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2008
Filed:
Jun. 08, 2004
Naoyoshi Hatakeyama, Yamaguchi, JP;
Shinji Tanaka, Yamaguchi, JP;
Hidetoshi Ono, Yamaguchi, JP;
Kouichi Kodoi, Yamaguchi, JP;
Naoyoshi Hatakeyama, Yamaguchi, JP;
Shinji Tanaka, Yamaguchi, JP;
Hidetoshi Ono, Yamaguchi, JP;
Kouichi Kodoi, Yamaguchi, JP;
Idemitsu Petrochemical Co., Ltd., Tokyo, JP;
Abstract
Provided by the present invention are an adamantyl vinyl ether compound which is useful as a monomer for functional resins in the photolithography field or a raw material therefor and medical and agricultural intermediates and a production process for the same. The present invention relates to a production process for an adamantyl vinyl ether compound, characterized by subjecting an adamantyl vinyl ether compound having a specific structure and alcohol having an eliminating group in a β position to chloroalkyl-etherification, then subjecting it to etherification to form an adamantyl group-containing ether and then subjecting it to vinyl-etherification.