Nara, Japan

Naoto Kubo

This inventor holds 1 USPTO granted patent. Top assignee: Rohm and Haas Electronic Materials Cmp Holdings, Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoto Kubo. Retrieved from https://idiyas.com/inventor/naoto-kubo-c3cetwmi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Naoto Kubo: Innovator in Polishing Technology

Introduction

Naoto Kubo is a notable inventor based in Nara Prefecture, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of polishing processes.

Latest Patents

Kubo holds a patent for a "Window portion with an adjusted rate of wear." This invention involves a polishing pad that includes a polishing layer, featuring a transparent window portion. The window portion is designed with dispersed particles that increase the rate at which it wears away during polishing operations. This innovation helps to avoid the formation of lumps in the polishing layer, thereby improving the overall performance of the polishing process.

Career Highlights

Naoto Kubo is associated with Rohm and Haas Electronic Materials Company Holdings, Inc., where he applies his expertise in materials science and engineering. His work at this company has allowed him to develop and refine technologies that are crucial for various applications in the electronics industry.

Collaborations

Kubo has collaborated with William D. Budinger, a fellow innovator in the field. Their partnership has likely contributed to advancements in polishing technologies and materials.

Conclusion

Naoto Kubo's contributions to polishing technology through his patent demonstrate his innovative spirit and commitment to improving industrial processes. His work continues to influence the field and showcases the importance of research and development in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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